Definition: A key device in the manufacture of chips, which uses specific wavelengths of light to radiate, and precisely imprints specific images on the mask plate onto the silicon wafer.
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peculiarity
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Lithography machine according to the degree of automation is mainly divided into manual, semi-automatic, automatic. The main components of the lithography machine are light source system, mask plate fixing system, sample table and control system. The light source system is one of the core of lithography, mainly from mercury lamp or laser, the early lithography machine mainly uses mercury lamp, power from the beginning of 1KW to 5Kw, later in order to improve the resolution and use laser as a light source, and now the laser power used in lithography machine can reach 60Kw level.
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The wavelength generated by common light sources mainly has the following types;
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g line -- 436nm
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h line -- 405nm
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i wire -- 365nm
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KrF (DUV) - 248nm
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ArF——193nm
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Extreme ultraviolet light (EUV) - 10~15nm
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Performance index
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The main performance indicators of the lithography machine are resolution, engraving accuracy, light source wavelength, uniform light intensity and so on.
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Lithographic process
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Gas base film, rotary gluing, soft drying, alignment and exposure, baking after exposure, development, hard film baking, development inspection.
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At present, lithography machines are mainly in a few companies, of which the Netherlands' ASML is the world's largest lithography machine company and the world's most advanced lithography machine company, followed by Japan's Nikon, Canon, and China's Shanghai Microelectronics Equipment.

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